AVENTIA

WIPO WIPO 2008

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The International trademark AVENTIA was filed as Word mark on 04/03/2008 at the World Intellectual Property Organization.

Trademark Details Last update: October 16, 2018

Trademark form Word mark
File reference 964862
Register number 242647
Countries em Japan South Korea Singapore United States of America (USA) Switzerland China Russia
Base trademark AT No. 242 647, December 28, 2007
Application date April 3, 2008
Expiration date April 3, 2018

Trademark owner

SEZ-Straße 1
A-9500 Villach
AT

Trademark representatives

351 California Street, Suite 550 San Francisco, CA 94104 US

goods and services

01 Chemicals; liquid and gaseous media for the processing of semi-finished products for semiconductors and silicon wafers
07 Machines for the manufacture of semiconductors and microelectronic semiconductor products, machines for processing semi-finished products for semiconductors and silicon wafers, machines for etching, cleaning, polishing, roughening and drying of semi-finished products for semiconductors
42 Technical planning and design of machines for the manufacture of semiconductors and microelectronic semiconductor products, and of machines for the processing of semi-finished parts of semiconductors and silicon wafers

Trademark history

Date Document number Area Entry
October 13, 2018 2018/41 Gaz Deletion
April 8, 2016 2017/11 Gaz US RAW: Total Invalidation
September 29, 2009 2009/45 Gaz EM RAW: Rule 18ter(2)(ii) GP following a provisional refusal
September 17, 2009 2012/52 Gaz KR RAW: Rule 18ter(2)(ii) GP following a provisional refusal
May 22, 2009 2009/22 Gaz EM Rejection
May 7, 2009 2009/26 Gaz SG RAW: Protection Granted
April 21, 2009 2009/22 Gaz RAW: Limitation
March 26, 2009 2009/17 Gaz CN Rejection
February 24, 2009 2009/11 Gaz KR Rejection
January 29, 2009 2009/5 Gaz JP RAW: Protection Granted
April 3, 2008 2008/24 Gaz AT Registration

ID: 14964862