Plasma Wafer

WIPO WIPO 2008

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The International trademark Plasma Wafer was filed as Word mark on 01/30/2008 at the World Intellectual Property Organization.

Trademark Details Last update: August 14, 2018

Trademark form Word mark
File reference 953664
Countries China Germany France South Korea United States of America (USA)
Base trademark JP No. 2007-101659, September 28, 2007
Application date January 30, 2008
Expiration date January 30, 2018

Trademark owner

1-2-1 Shibaura, Minato-ku,
Tokyo 105-8634
JP

Trademark representatives

Gran Tokyo South Tower, 1-9-2, Marunouchi, JP

goods and services

09 Wafers for solar cells; semiconductor wafers; semiconductor silicon wafers; single-crystal silicon wafers; ingots of semiconductor silicon; single-crystal silicon for integrated circuits

Trademark history

Date Document number Area Entry
August 11, 2018 2018/32 Gaz Deletion
May 14, 2010 2010/24 Gaz US Rejection
January 19, 2010 2010/4 Gaz DE RAW: Rule 18ter(2)(i) GP following a provisional refusal
March 24, 2009 2009/14 Gaz KR Decision on opposition
January 27, 2009 2009/7 Gaz CN Rejection
November 20, 2008 2008/50 Gaz KR Rejection
September 17, 2008 2008/40 Gaz DE Rejection
May 21, 2008 2008/21 Gaz US Rejection
January 30, 2008 2008/9 Gaz JP Registration

ID: 14953664