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The International trademark EMAT TECHNOLOGY was filed as Word mark on 02/22/2007 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 930982 |
| Countries | 
|
| Base trademark |
No. ,
July 18, 2024
|
| Application date | February 22, 2007 |
| Expiration date | February 16, 2009 |
Trademark owner
8248 Randolph Road NE
Moses Lake, WA 98837
US
Moses Lake, WA 98837
US
Trademark representatives
12400 Wilshire Boulevard,
Seventh Floor
US
goods and services
01
Chemicals for use in the manufacture of semiconductor
devices, integrated circuits, printed wiring boards, display
panels, substrates, packages; chemical solutions, additives,
standards and reagents for use in the manufacture of
electronic devices and components thereof; chemical
solutions, standards, reagents and additives for
electrochemical and chemical deposition of thin films and
plating; chemical precursors for chemical vapor deposition
and atomic layer deposition of thin films; chemicals used in
the manufacture of photovoltaic devices, namely,
photovoltaic cells and solar cells; chemicals used in the
manufacture of batteries, namely, anodes, cathodes and
electrolytes; chemicals used in the manufacture of fuel
cells, namely membranes, anodes, cathodes, electrolytes
09
Electronic components being parts for solar installations,
namely, electronic sensors for measuring solar radiation,
solar cells, solar cells for electricity generation;
apparatus for converting solar radiation to electrical
energy, namely, photovoltaic solar modules and photovoltaic
solar thermal hybrid modules; apparatus for converting
chemical energy into electrical energy, namely, fuel cells;
apparatus for the storage of energy, namely batteries,
electric cells; electronic material components being parts
of electronic devices, namely, integrated circuits,
substrates, printed wiring boards, liquid crystal displays,
flat panel displays, and material components used in
apparatus to produce electronic devices, namely, fabrication
equipment for film, deposition and surface penetration,
vapor deposition processing equipment as well as metrology
equipment for process control
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| August 24, 2009 | 2009/39 Gaz | US | RAW: Total Ceasing Effect |
| March 20, 2009 | 2012/51 Gaz | KR | Decision on opposition |
| January 26, 2009 | 2013/15 Gaz | RU | Decision on opposition |
| June 20, 2008 | 2008/28 Gaz | RU | Rejection |
| June 6, 2008 | 2008/25 Gaz | EM | RAW: Final Reversing Refusal |
| June 2, 2008 | 2008/24 Gaz | KR | Rejection |
| May 1, 2008 | 2008/18 Gaz | JP | RAW: Protection Granted |
| April 24, 2008 | 2008/21 Gaz | SG | RAW: Protection Granted |
| September 4, 2007 | 2007/36 Gaz | EM | Rejection |
| February 22, 2007 | 2007/32 Gaz | US | Registration |
ID: 14930982