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The International trademark LL BHF was filed as Word mark on 02/22/2007 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 926203 |
| Register number | 5019388 |
| Countries | 
|
| Base trademark |
No. 5019388,
January 19, 2007
|
| Application date | February 22, 2007 |
| Expiration date | February 22, 2027 |
Trademark owner
4-1-1 Fushimi-machi,
Chuo-ku, Osaka City
JP
Chuo-ku, Osaka City
JP
Trademark representatives
First Shin-Osaka MT Bldg.
2nd Floor,
JP
goods and services
01
Chemicals used in industry; chemicals used in manufacturing
structures of semiconductors, integrated circuits,
microscale and nano-scale and for acceleration of etching
process and for forming patterns on a substrate; chemicals
used in manufacturing semiconductors; chemical cleaners,
namely, etching agents for rinsing semiconductors; chemicals
to be used for forming patterns on the substrates of flat
panel display such as liquid crystal and electroluminescent
(EL); chemicals used for manufacturing of flat panel
display; chemical cleanser, namely, etching agent to be used
for manufacturing of flat panel display
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| December 21, 2016 | 2017/8 Gaz | Extension | |
| October 28, 2015 | 2015/45 Gaz | US | RAW: Total Invalidation |
| November 3, 2008 | 2008/47 Gaz | SG | RAW: Final Reversing Refusal |
| October 10, 2008 | 2008/43 Gaz | US | RAW: Final Reversing Refusal |
| September 23, 2008 | 2008/49 Gaz | GB | RAW: Protection Granted |
| June 3, 2008 | 2008/26 Gaz | KR | RAW: Protection Granted |
| August 13, 2007 | 2007/34 Gaz | SG | Rejection |
| July 26, 2007 | 2007/31 Gaz | US | Rejection |
| February 22, 2007 | 2007/26 Gaz | JP | Registration |
| Partial deletion |
ID: 14926203