LAL Logo (WIPO, 04/10/2006)
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The International trademark LAL was filed as Word mark on 04/10/2006 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 904060 |
| Register number | 4927572 |
| Countries | 
|
| Base trademark |
No. 4927572,
February 10, 2006
|
| Application date | April 10, 2006 |
| Expiration date | April 10, 2026 |
Trademark owner
4-1-1 Fushimi-machi,
Chuo-ku, Osaka City
JP
Chuo-ku, Osaka City
JP
Trademark representatives
First Shin-Osaka MT Bldg.
2nd Floor,
JP
goods and services
01
Chemicals used in industry; chemicals used in manufacturing
structures of semiconductors, integrated circuits,
microscales and nano-scales and for acceleration of etching
process and for forming patterns on a substrate; chemicals
used in manufacturing semiconductors; chemical cleaners,
namely, etching agents for rinsing semiconductors; chemicals
to be used for forming patterns on the substrates of flat
panel display such as liquid crystal and electroluminescent
(EL); chemicals used for manufacturing of flat panel
display; chemical cleanser, namely, etching agent to be used
for manufacturing of flat panel display
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| February 25, 2016 | 2016/23 Gaz | Extension | |
| April 20, 2009 | 2012/51 Gaz | GB | Decision on opposition |
| July 14, 2008 | 2012/49 Gaz | US | Decision on opposition |
| January 29, 2008 | 2008/7 Gaz | DE | RAW: Final Reversing Refusal |
| January 4, 2008 | 2008/5 Gaz | KR | RAW: Protection Granted |
| September 7, 2007 | 2007/37 Gaz | DE | Rejection |
| July 9, 2007 | 2007/33 Gaz | SG | RAW: Protection Granted |
| January 22, 2007 | 2007/5 Gaz | GB | Rejection |
| December 29, 2006 | 2007/1 Gaz | US | Rejection |
| April 10, 2006 | 2006/47 Gaz | JP | Registration |
ID: 14904060