HELIOS

WIPO WIPO 2003

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The International trademark HELIOS was filed as Word mark on 04/02/2003 at the World Intellectual Property Organization.

Trademark Details Last update: March 17, 2023

Trademark form Word mark
File reference 808125
Register number 30248592.9/07
Countries Japan China
Base trademark DE No. 302 48 592.9/07, February 14, 2003
Application date April 2, 2003
Expiration date April 2, 2033

Trademark owner

Daimlerstrasse 10
89160 Dornstadt
DE

Trademark representatives

Dority & Manning, P.A., Post Office Box 1449 US

goods and services

07 Machines, apparatuses and devices and systems consisting thereof for the thermal treatment of substrates, semiconductor substrates, silicon discs and wafers for the production of semiconductor chips
11 Rapid heating apparatuses for the treatment and production of semiconductors; epitaxial reactors for epitaxial processing
37 Maintenance and installation of the goods mentioned in classes 7 and 11
42 Developing the goods mentioned in classes 7 and 11

Trademark history

Date Document number Area Entry
April 2, 2023 2023/11 Gaz Extension
April 2, 2013 2013/14 Gaz Extension
August 7, 2012 2012/44 Gaz CN RAW: Rule 18ter(4) protected goods and services
July 4, 2007 2007/31 Gaz SE RAW: Final Reversing Refusal
April 3, 2007 2007/15 Gaz FI RAW: Final Reversing Refusal
June 6, 2006 2006/28 Gaz GB RAW: Final Reversing Refusal
May 9, 2005 2005/21 Gaz HU Decision on opposition
December 22, 2004 2005/2 Gaz NO RAW: Protection Granted
December 7, 2004 2004/43 Gaz SE Rejection
September 7, 2004 2004/30 Gaz HU Rejection
August 24, 2004 2004/28 Gaz FI Rejection
July 26, 2004 2004/33 Gaz JP Decision on opposition
June 15, 2004 2004/19 Gaz CN Rejection
February 16, 2004 2004/4 Gaz JP Rejection
September 30, 2003 2003/20 Gaz GB Rejection
April 2, 2003 2003/17 Gaz DE Registration
Partial deletion

ID: 14808125