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The International trademark A2PL was filed as Word mark on 07/29/2022 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1695665 |
| Register number | 302022101714 |
| Countries | 
|
| Base trademark |
No. 30 2022 101 714,
March 3, 2022
|
| Application date | July 29, 2022 |
| Expiration date | July 29, 2032 |
Trademark owner
Hermann-von-Helmholtz-Platz 6
76344 Eggenstein-Leopoldshafen
DE
76344 Eggenstein-Leopoldshafen
DE
Trademark representatives
Friedrichstraße 6
70174 Stuttgart
DE
goods and services
01
Chemical products for use in lithography; lithographic
chemicals; photoresists for lithography; resists for
lithography; liquid photosensitive resin for the fabrication
of three-dimensional models
07
3D printers; lithographic machines; machines for
laser-lithography; machinery for shaping plastic material;
fixing devices for positioning workpieces during 3D
printing, particularly in the submicrometer range
09
Scientific, photographic, optical, measuring apparatus and
instruments; optical installations for the lithographic
production of two-dimensional and three-dimensional objects;
focusable and controllable laser installations for
lithography; optical laser installations; testing apparatus
for non-medical purposes; observation instruments; apparatus
and instruments for microscopy; computer software;
industrial process control software
40
3D reproduction services; lithographic material treatment;
treatment of materials by laser beam, namely,
microstructuring and nanostructuring; lithographic printing;
laser scribing services; treatment of materials by laser
beam
42
Science and technological services and research and design
relating thereto; industrial research services; physics
[research]; engineering services; chemistry services;
chemical laboratories; optical research laboratories;
chemical product development for use in lithography;
development of photoresists for lithography; research and
development services in the field of laser system
development and laser applications for technical, physical,
biological and medical use; development of new technology
for others; design and development of software for control,
regulation and monitoring of lithography devices; design and
development of software for control, regulation and
monitoring of 3D printers; design and development of
software for control, regulation and monitoring of devices
for laser-lithography; computer software development for
others; software design for others; design of mathematical
models
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| June 26, 2023 | 2023/26 Gaz | US | Rejection |
| April 5, 2023 | 2023/14 Gaz | EM | Rejection |
| July 29, 2022 | 2022/44 Gaz | DE | Registration |
ID: 141695665