SiCrystal

WIPO WIPO 2021

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The International trademark SiCrystal was filed as Word mark on 02/02/2021 at the World Intellectual Property Organization.

Trademark Details Last update: August 4, 2023

Trademark form Word mark
File reference 1606695
Register number 302020110541
Countries European Community India Japan United States of America (USA) China Russia
Base trademark DE No. 30 2020 110 541, September 24, 2020
Application date February 2, 2021
Expiration date February 2, 2031

Trademark owner

Thurn-und-Taxis-Straße 20
90411 Nürnberg
DE

Trademark representatives

goods and services

01 Chemical products for industrial and scientific purposes, namely polycrystalline or monocrystalline materials, in particular for use in mechanics, optics and semiconductor technology and in particular for use as gemstones; crystalline semiconductor material; semiconductor single crystals; all aforementioned products based on silicon carbide or on aluminium oxide or on II-VI semiconductors, in particular zinc oxide, zinc sulphide, zinc selenide, magnesium oxide, magnesium sulphide, magnesium selenide, cadmium selenide or cadmium telluride, or on III-V semiconductors, in particular boron nitride, aluminium nitride, gallium nitride, gallium phosphide or gallium arsenide
09 Electronic materials, namely semiconductor materials, in particular in form of wafers, as far as included in this class; semiconductors; semiconductor wafers; wafers for power electronic components; all aforesaid products based on silicon carbide or on aluminium oxide or on II-VI semiconductors, in particular zinc oxide, zinc sulphide, zinc selenide, magnesium oxide, magnesium sulphide, magnesium selenide, cadmium selenide or cadmium telluride, or on III-V semiconductors, in particular boron nitride, aluminium nitride, gallium nitride, gallium phosphide or gallium arsenide
40 Processing of semiconductor materials, semiconductor wafers or semiconductor components; customer-specific contract manufacturing or processing of semiconductor wafers; all aforesaid services for semiconductors based on silicon carbide or aluminium oxide or on II-VI semiconductors, in particular zinc oxide, zinc sulphide, zinc selenide, magnesium oxide, magnesium sulphide, magnesium selenide, cadmium selenide or cadmium telluride, or on III-V semiconductors, in particular boron nitride, aluminium nitride, gallium nitride, gallium phosphide or gallium arsenide

Trademark history

Date Document number Area Entry
July 31, 2023 2023/31 Gaz EM RAW: Rule 18ter(2)(ii) GP following a provisional refusal
November 5, 2022 2022/45 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
September 22, 2022 2022/38 Gaz JP RAW: Rule 18ter(2)(i) GP following a provisional refusal
August 16, 2022 2022/36 Gaz IN Rejection
May 26, 2022 2022/22 Gaz JP Rejection
March 21, 2022 2022/12 Gaz CN Rejection
December 6, 2021 2021/49 Gaz RU Rejection
November 23, 2021 2022/2 Gaz RAW: Limitation
September 29, 2021 2021/39 Gaz US Rejection
September 13, 2021 2021/38 Gaz EM Rejection
August 31, 2021 2021/36 Gaz IN Rejection
February 2, 2021 DE Registration

ID: 141606695