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The International trademark Ex-LAL was filed as Word mark on 03/18/2020 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1534496 |
| Register number | 6221738 |
| Countries | 
|
| Base trademark |
No. 6221738,
February 3, 2020
|
| Application date | March 18, 2020 |
| Expiration date | March 18, 2030 |
Trademark owner
4-1-1 Fushimi-machi,
Chuo-ku, Osaka City
JP
Chuo-ku, Osaka City
JP
Trademark representatives
First Shin-Osaka MT Bldg., 2nd Floor,
5-13-9 Nishinakajima,
JP
goods and services
01
Etchants for use in the manufacture of semi-conductors;
etchants for use in the manufacture of printed circuit
boards; etching solutions [acids]; detergents for industrial
use as part of manufacturing operations; fluorspar
compounds; fluorine; chemicals for use in industry
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| October 6, 2021 | 2021/40 Gaz | KR | Rejection |
| March 24, 2021 | 2021/12 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| January 15, 2021 | 2021/2 Gaz | SG | Rejection |
| October 29, 2020 | 2020/44 Gaz | EM | Rejection |
| October 15, 2020 | 2020/42 Gaz | CN | Rejection |
| July 21, 2020 | 2020/30 Gaz | US | Rejection |
| March 18, 2020 | 2020/22 Gaz | JP | Registration |
ID: 141534496