ADVANCED SURFACE CREATION

WIPO WIPO 2019

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The International trademark ADVANCED SURFACE CREATION was filed as Word mark on 08/22/2019 at the World Intellectual Property Organization.

Trademark Details Last update: April 25, 2023

Trademark form Word mark
File reference 1508920
Register number 6115398
Countries China European Community South Korea
Base trademark JP No. 6115398, January 18, 2019
Application date August 22, 2019
Expiration date August 22, 2029

Trademark owner

4-4-26 Sakuragawa,
Naniwa-ku,
JP

Trademark representatives

Iwata Tokyu Building, 8th Floor, 2-8, Bakuromachi 3-Chome, JP

goods and services

01 Hydrophilic agents for industrial polishing; detergents for industrial use; chemicals; chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates
03 Abrasive paper (sand paper); abrasive cloth; abrasive sand, polishing paper; polishing preparations; abrasive preparations
07 Holding devices for semiconductor wafer surface polishing machines and apparatus; templates for semiconductor wafer surface polishing machines and apparatus; blank templates for semiconductor wafer surface polishing machines and apparatus; mounting pads and sheets for semiconductor wafer surface polishing machines and apparatus; polishing pads for semiconductor wafer surface polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer surface polishing machines and apparatus; semiconductor wafer surface polishing machines and apparatus; parts and accessories of semiconductor wafer surface polishing machines and apparatus; semiconductor manufacturing machines and apparatus; holding devices for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting pads and sheets for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; holding devices for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting pads and sheets for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; holding devices for polishing machines and apparatus for manufacturing hard disks, templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting pads and sheets for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; holding devices for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting pads and sheets for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus; polishing pads for electric polishing machines; polishing cloth used as parts or accessories of electric polishing machines
21 Polishing cloth for electric polishing machines

Trademark history

Date Document number Area Entry
July 6, 2021 2021/27 Gaz KR Rejection
January 18, 2021 2021/3 Gaz KR Rejection
July 15, 2020 2020/30 Gaz CN Rejection
June 23, 2020 2020/26 Gaz EM Rejection
May 19, 2020 2020/23 Gaz CN Rejection
August 22, 2019 2020/1 Gaz JP Registration

ID: 141508920