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The International trademark HSN was filed as Word mark on 07/09/2019 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1490103 |
| Register number | 6153066 |
| Countries | 
|
| Base trademark |
No. 6153066,
June 14, 2019
|
| Application date | July 9, 2019 |
| Expiration date | July 9, 2029 |
Trademark owner
4-1-1 Fushimi-machi,
Chuo-ku, Osaka City
JP
Chuo-ku, Osaka City
JP
Trademark representatives
First Shin-Osaka MT Bldg.
2nd Floor,
JP
goods and services
01
Etchants for use in the manufacture of semi-conductors;
etchants for use in the manufacture of printed circuit
boards; etching solutions [acids]; detergents for industrial
use as part of manufacturing operations; fluorspar
compounds; fluorine; chemicals for use in industry
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| December 9, 2020 | 2020/50 Gaz | KR | Rejection |
| September 22, 2020 | 2020/39 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| July 15, 2020 | 2020/29 Gaz | KR | Rejection |
| March 18, 2020 | 2020/12 Gaz | SG | Rejection |
| December 10, 2019 | 2019/51 Gaz | CN | Rejection |
| November 5, 2019 | 2019/45 Gaz | US | Rejection |
| July 9, 2019 | 2019/38 Gaz | JP | Registration |
ID: 141490103