RADIANCE

WIPO WIPO 2017

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The International trademark RADIANCE was filed as Word mark on 10/27/2017 at the World Intellectual Property Organization.

Trademark Details Last update: July 3, 2019

Trademark form Word mark
File reference 1399834
Register number 2773795
Countries China Japan South Korea
Base trademark US No. 2773795, October 14, 2003
Application date October 27, 2017
Expiration date October 27, 2027

Trademark owner

3050 Bowers Avenue
Santa Clara CA 95054
US

Trademark representatives

1100 Peachtree Street, Suite 2800, M/S:IP Docketing - 22 US

goods and services

07 Semiconductor wafer processing equipment; plasma etchers; ion implanters; chemical mechanical polishers
09 Operational software for epitaxial reactors; chemical vapor deposition reactors; physical vapor deposition reactors; semiconductor wafer process and diagnostic and control equipment

Trademark history

Date Document number Area Entry
July 1, 2019 2019/27 Gaz KR Rejection
June 13, 2019 2019/25 Gaz JP RAW: Rule 18ter(2)(ii) GP following a provisional refusal
January 2, 2019 2019/1 Gaz KR Rejection
December 20, 2018 2018/51 Gaz JP Rejection
November 15, 2018 2018/49 Gaz CN Rejection
October 27, 2017 2018/16 Gaz US Registration

ID: 141399834