nanoscribe

WIPO WIPO 2017

Schützen Sie diese Marke vor Nachahmern!

Mit unserer Markenüberwachung werden Sie automatisch per E-Mail über Nachahmer und Trittbrettfahrer benachrichtigt.

Die Internationale Marke nanoscribe wurde als Wortmarke am 19.10.2017 bei der Weltorganisation für geistiges Eigentum angemeldet.

Markendetails Letztes Update: 04. Februar 2021

Markenform Wortmarke
Aktenzeichen 1399117
Registernummer 302017010025
Länder Europäische Gemeinschaft Vereinigte Staaten von Amerika (USA) China
Basismarke DE Nr. 30 2017 010 025, 28. Juli 2017
Anmeldedatum 19. Oktober 2017
Ablaufdatum 19. Oktober 2027

Markeninhaber

Hermann-von-Helmholtz-Platz 6
76344 Eggenstein-Leopoldshafen
DE

Markenvertreter

Friedrichstraße 6 70174 Stuttgart DE

Waren und Dienstleistungen

01 Chemical products for use in lithography; lithographic chemicals; photoresists for lithography; resists for lithography; liquid photosensitive resin for the fabrication of three-dimensional models
07 3D printers; lithographic machines; machines for laser-lithography; machinery for shaping plastic material
09 Scientific, photographic, optical, measuring apparatus and instruments; optical installations for the lithographic production of two-dimensional and three-dimensional objects; focusable and controllable laser installations for lithography; substrate carriers with a resolution in the submicrometer range; laseroptical installations; positioning installations; testing apparatus for non medical purposes; observation instruments; apparatus and instruments for microscopy; computer software; industrial process control software
40 3D reproduction services; lithographic material treatment; treatment of materials by laser beam, namely, microstructuring and nanostructuring; lithographic printing; laser scribing services
42 Science and technological services and research and design relating thereto; industrial research services; physics [research]; engineering services; chemistry services; chemical laboratories; optical research laboratories; chemical product development for use in lithography; development of photoresists for lithography; research and development services in the field of laser system development and laser applications for technical, physical, biological and medical use; development of new technology for others; design and development of software for control, regulation and monitoring of lithography devices; design and development of software for control, regulation and monitoring of 3D printers; design and development of software for control, regulation and monitoring of devices for laser-lithography; computer software development for others; software design for others; design of mathematical models
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen

Markenhistorie

Datum Belegnummer Bereich Eintrag
04. November 2019 2019/45 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
06. Dezember 2018 2018/52 Gaz CN Ablehnung
28. September 2018 2018/40 Gaz EM Ablehnung
11. Mai 2018 2018/20 Gaz US Ablehnung
19. Oktober 2017 2018/15 Gaz DE Eintragung

ID: 141399117