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The International trademark Ultratech/CNT was filed as Word mark on 11/16/2017 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1383811 |
| Countries | 
|
| Base trademark |
No. 87113513,
July 22, 2016
|
| Application date | November 16, 2017 |
| Expiration date | February 26, 2018 |
Trademark owner
3050 Zanker Road
San Jose CA 95134
US
San Jose CA 95134
US
Trademark representatives
149 Commonwealth Drive,
Suite 1001
US
goods and services
07
Atomic layer deposition machine comprised of a reaction
chamber, precursor lines and a cabinet, all sold as a unit
for performing atomic deposition layering and for use in
applying atomic layer coating on various surfaces, namely,
on gate dielectrics, gate electrodes, metal interconnects,
diffusion barriers, DRAM, multilayer-capacitors, read heads,
antireflection, optical filters, OLED layers, photonic
crystals, transparent conductors, electroluminescence, solar
cells, lasers, integrated optics, MEMS, etch resistance,
hydrophobic/antistiction, blade edges, molds and dies, solid
lubricants, anti-corrosion, inside pores, nanotubes, around
particles AFM tips, chemicals, catalysis, fuel cells, roll
to roll, internal tube liners, nano-glue, biocompatible
materials, medical devices, medical implantable devices,
timed-drug released materials, coatings of anti-bacterial
agents onto surfaces, anti-clotting coatings, and magnetics
or for use as combined with a semiconductor wafer processing
machine as a dual purpose unit
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| September 10, 2018 | 2018/40 Gaz | US | RAW: Total Ceasing Effect |
| August 30, 2018 | 2018/36 Gaz | JP | Rejection |
| August 16, 2018 | 2018/37 Gaz | SG | Rejection |
| June 6, 2018 | 2018/23 Gaz | EM | Rejection |
| November 16, 2017 | 2017/51 Gaz | US | Registration |
ID: 141383811