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Die Internationale Marke scia Systems wurde als Wortmarke am 26.04.2017 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1371537 |
| Registernummer | 302016111010 |
| Länder | 
|
| Basismarke |
Nr. 30 2016 111 010,
17. Januar 2017
|
| Anmeldedatum | 26. April 2017 |
| Ablaufdatum | 26. April 2027 |
Markeninhaber
Clemens-Winkler-Straße 6c
09116 Chemnitz
DE
09116 Chemnitz
DE
Markenvertreter
Grillparzerstr. 14
81675 München
DE
Waren und Dienstleistungen
07
Installations, machines and machine tools for the processing
of substrates, in particular substrates of semiconductor
material, silicon, glass, metal, plastic or polymeric
material; installations, machines and machine tools for
coating substrates by means of chemical or physical vapor
deposition techniques; vacuum coating machines and
installations; installations, machines and machine tools for
the processing of substrates by means of ion beams;
installations, namely machines and machine tools and holding
devices for machine tools for the coating and etching of
substrates, in particular substrates of semiconductor
material, silicon, glass, metal, plastic or polymeric
material by means of ion beams; installations, machines and
machine tools for the processing of optical components, in
particular optical lenses and optical mirrors;
installations, machines and machine tools for processing
electronic components, in particular microelectronic
components, chips and integrated circuits
09
Electrical apparatus, namely sputter equipment, electron
beam installations and ion beam installations; measuring,
signaling and checking (supervision) apparatus and
instruments for machines and installations for the treating
of substrates, in particular substrates of semiconductor
material, silicon, glass, metal, plastic or polymeric
material; data processing equipment for machines and
installations for the treating of substrates, in particular
substrates of semiconductor material, silicon, glass, metal,
plastic or polymeric material; computers and computer
software for machines and installations for the treating of
substrates, in particular substrates of semiconductor
material, silicon, glass, metal, plastic or polymeric
material; installations for producing ion beams; electrical
and electronic control apparatus for ion beam etching;
electrical power supply apparatus for ion beams; ionization
apparatus for scientific or laboratory use; computer
software for use in processing semiconductor wafers;
semiconductor wafers and devices, in particular of
microelectronic semiconductor apparatus
37
Installation of industrial machinery; maintenance of
industrial machinery; repair of industrial machinery;
installation, repair and maintenance of installations,
machines and machine tools for the processing of substrates,
in particular substrates of semiconductor material, silicon,
glass, metal, plastic or polymeric material; installation,
maintenance and repair of ion beam installations and
electron beam installations; installation, maintenance and
repair of measuring, signaling and checking (supervision)
apparatus and instruments for machines and installations for
the treating of substrates, in particular substrates of
semiconductor material, silicon, glass, metal, plastic or
polymeric material; installation of computers; maintenance
of computers; repair of computers
40
Material treatment by means of ion beams; etching, in
particular using ion beams; application of coatings using
vacuum deposition techniques; treatment and processing of
substrates in particular substrates of semiconductor
material, silicon, glass, metal, plastic or polymeric
material; treatment and processing of optical components;
treatment and processing of electronic components
42
Engineering; design and development of industrial machinery
and installations; design and development of installations,
machines and machine tools for the processing of substrates,
in particular substrates of semiconductor material, silicon,
glass, metal, plastic or polymeric material; design and
development of ion beam installations; development of
industrial processes; development of industrial processes
for the treating of substrates, in particular substrates of
semiconductor material, silicon, glass, metal, plastic or
polymeric material
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 21. Mai 2018 | 2018/21 Gaz | CN | Ablehnung |
| 26. April 2017 | 2017/41 Gaz | DE | Eintragung |
ID: 141371537