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The International trademark SINGULUS was filed as Word mark on 12/14/2016 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1355619 |
| Countries | 
|
| Base trademark |
No. 015958788,
October 19, 2016
|
| Application date | December 14, 2016 |
| Expiration date | December 14, 2026 |
Trademark owner
Hanauer Landstrasse 103
63796 Kahl am Main
DE
63796 Kahl am Main
DE
Trademark representatives
Siebertstr. 3
81675 München
DE
goods and services
01
Coating compositions [chemicals for vacuum coating], other
than paint; chemical coatings for manufacturing surface
compositions using physical vapour deposition; ceramic
sputtering targets [chemical materials]
06
Metal sputtering targets
07
Machines for vacuum coating of disc-shaped plastic
substrates by sputtering or vacuum deposition of metal,
metal alloys, metal oxides or metal nitrides for the
production of optical storage media; machines for vacuum
coating, in particular physical or chemical vapour
deposition, on planar and three-dimensional substrates, in
particular plastic, glass, ceramic or metal substrates, in
particular in the fields of food, beverages, cosmetics,
jewelry, automotive, optics, sanitary engineering, lighting,
medical engineering, consumer and household electronics and
other industrial applications; machines for multi-layer
vacuum deposition of metals or ceramics for the production
of storage media, in particular disc-shaped storage media;
machines for vacuum deposition of layers, in particular
transparent, conductive, metallic, semi-conductive,
non-conductive, dielectric or transparent/electrically
conductive, or passivating layers, in particular using
physical or chemical vapour deposition on substrates, in
particular on glass and silicon; machines for large area
coating using physical vapour deposition, in particular for
the layer deposition of copper, indium, gallium, selenium,
sulfur, indium sulfide, sodium fluoride, potassium fluoride,
aluminium or combinations of these materials on glass or
flexible substrates for the production of thin film solar
cells; machines for large area coating using physical vapour
deposition, in particular for the layer deposition of
cadmium, tellurium, cadmium sulfide, cadmium chloride or
combinations of these materials on glass substrates for the
production of thin film solar cells; machines for metal
organic chemical vapour deposition (MO-CVD) and metal
organic vapour phase epitaxy (MOVPE); machines for large
area coating using vacuum deposition, in particular
horizontal or vertical sputtering deposition, on glass,
metal or plastic substrates, in particular for the
production of solar cells; machines for injection molding,
vacuum deposition, lacquering (spin-coating), bonding,
UV-curing and quality inspection for the production of
optical storage media, in particular CD, DVD5/10, DVD9;
machines for injection molding, vacuum deposition,
lacquering (spin-coating), (wet) embossing, UV-curing and
quality inspection for the production of optical storage
media, in particular optical storage disc, in particular
BD25/33/50/66/100 (Blu-ray disc), Ultra HD Blu-ray disc;
machines for injection molding, in particular of thin-wall
optical parts and micro-structured parts; machines for nano
imprint lithography by (wet) embossing, in particular for
the production of diffractive optical components,
microfluidic devices and micro electro mechanical structures
(MEMS); machines for cleaning, vacuum deposition,
spin-coating for photoresist, laser exposure, photoresist
developing, laser beam recording and quality inspection, in
particular for the production of disc masters for CD,
DVD5/10, DVD 9, optical storage disc and other recording
formats; machines for multi-layer deposition of magnetic and
non-magnetic materials by physical vapour deposition, in
particular rotating substrate deposition, for research,
development and production; machines for multi-layer
deposition of magnetic and non-magnetic materials by
physical vapour deposition, in particular
linear-dynamic-deposition, for research, development and
production of MRAM (Magnetoresistive random-access memory)
cells and magnetic sensors, in particular for anisotropic
magnetoresistance (AMR), giant magnetoresistance (GMR) and
tunnel magnetoresistance (TMR) structures; machines for
thermal treatment (heating and cooling) of pre-coated large
area substrates in a controlled gas atmosphere for the
production of solar cells, in particular thin film solar
cells; in-line machines for wet chemical treatment, in
particular etching, cleaning, coating and drying, in
particular for thin-film solar cells; machines for wet
chemical treatment of batches of substrates, in particular
etching, cleaning, coating and drying of substrates, in
particular of semiconductor or glass wafers for production
of crystalline solar cells, semiconductor devices and
optical components; machines for wet chemical bath
deposition of layers, in particular cadmium sulfide, zinc
oxide-sulfide and zinc sulfide for thin film solar cells;
in-line machines for wet chemical treatment, in particular
cleaning, acidic etching, alkaline etching and drying, for
single side and double side processing of glass and silicon
substrates; machines for wet chemical treatment of batches
of material, in particular chemical etching, cleaning and
drying of mono and multi crystalline silicon, in particular
chunks and ingot off cuts; combinations of machines for
automation, vacuum deposition, surface treatment, lacquering
(spray-coating), UV-curing or drying, for the refinement of
planar and three-dimensional substrates, in particular of
plastic, glass, ceramic or metal, in particular in the field
of food, beverages, cosmetics, jewelry, automotives, optics,
sanitary engineering, lighting, medical engineering,
consumer and household electronics or other industrial
applications; combinations of machines for automation,
vacuum deposition, wet chemical treatment, laser ablation,
screen print or thermal treatment for the manufacturing of
solar cells, in particular silicon solar cells; combinations
of machines for automation, vacuum deposition, wet chemical
treatment, laser ablation, thermal treatment, lamination or
contacting for the manufacturing of solar cells, in
particular thin film solar cells
09
Measuring apparatus and instruments for machines and/or
machine combinations
20
Receptacles of plastic for storing, transporting and
processing substrates, in particular silicon wafers
37
Installation, repair and maintenance services in relation to
machines, machine components and machine combinations;
installation, repair and maintenance services in relation to
measuring apparatus and instruments being parts of machines
and/or machine combinations; erecting of manufacturing
plants
41
Education; providing of training and training courses for
installation, maintenance and repair of machines and machine
combinations
42
Scientific and technological services and research and
design relating thereto; industrial analysis and research
services; design and development of industrial production
facilities; engineering, technical consultation, planning,
technical design of industrial production facilities;
analysis, development, research and technical optimization
related to function, productivity and cost of industrial
production processes; analysis, development, research and
technical optimization of industrial products and devices
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| February 11, 2021 | 2021/6 Gaz | JP | RAW: Rule 18ter(2)(i) GP following a provisional refusal |
| October 29, 2020 | 2020/45 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| July 29, 2020 | 2020/40 Gaz | RAW: Limitation | |
| November 13, 2018 | 2018/46 Gaz | CN | Rejection |
| July 4, 2018 | 2018/28 Gaz | LI | Rejection |
| June 25, 2018 | 2018/26 Gaz | CH | Rejection |
| June 8, 2018 | 2018/27 Gaz | ME | Rejection |
| May 16, 2018 | 2018/20 Gaz | DZ | Rejection |
| March 30, 2018 | 2018/16 Gaz | KZ | Rejection |
| February 16, 2018 | 2018/8 Gaz | RU | Rejection |
| January 11, 2018 | 2018/2 Gaz | JP | Rejection |
| December 18, 2017 | 2017/51 Gaz | IN | Rejection |
| July 28, 2017 | 2017/31 Gaz | US | Rejection |
| December 14, 2016 | 2017/26 Gaz | EM | Registration |
ID: 141355619