EUV RMQC EUV RESIST MANUFACTURING & QUALIFICATION CENTER Logo (WIPO, 04/26/2016)
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The International trademark EUV RMQC EUV RESIST MANUFACTURING & QUALIFICATION CENTER was filed as Figurative mark on 04/26/2016 at the World Intellectual Property Organization.
Logodesign (Wiener Klassifikation)
#Signs, notations, symbols #Other polygons #Letters presenting a special form of writing #Other signs, notations or symbols, º (temp), #, bar codes #Polygons with inscriptions projecting beyond the circumference #Letters written in double outline
| Trademark form | Figurative mark |
| File reference | 1318744 |
| Countries | 
|
| Base trademark |
No. 2016-023982,
March 4, 2016
|
| Application date | April 26, 2016 |
| Expiration date | April 26, 2026 |
Trademark owner
9-2, Higashi-Shinbashi 1-chome,
Minato-ku
JP
Minato-ku
JP
Trademark representatives
Gotanda Yamazaki Bldg. 6F,
13-6, Nishigotanda 7-chome,
JP
goods and services
01
Chemicals for use in industry; chemicals for use in the
manufacture of semiconductors; photoresists; photoresists
for extreme ultraviolet lithography
40
Preparation and processing of chemicals; custom manufacture
of chemicals; custom manufacture of chemicals for use in the
manufacture of semiconductors; custom manufacture of
photoresists; custom manufacture of photoresists for extreme
ultraviolet lithography
42
Testing, inspection, evaluation or research of chemicals;
provision of information relating to testing, inspection or
research of chemicals; quality control services
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| November 13, 2018 | 2018/46 Gaz | CN | Rejection |
| December 28, 2017 | 2018/7 Gaz | CN | Rejection |
| September 20, 2017 | 2017/43 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| August 24, 2017 | 2017/43 Gaz | KR | Rejection |
| April 19, 2017 | 2017/23 Gaz | EM | Rejection |
| December 1, 2016 | 2016/50 Gaz | US | Rejection |
| April 26, 2016 | JP | Registration |
ID: 141318744