WIPOProtect this trademark from copycats!
With our trademark monitoring alerts, you are automatically notified by email about copycats and free riders.
The International trademark LEAD was filed as Word mark on 06/24/2015 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1265787 |
| Countries | 
|
| Base trademark |
No. 30 2015 102 945,
May 28, 2015
|
| Application date | June 24, 2015 |
| Expiration date | June 24, 2025 |
Trademark owner
Siemensstrasse 100
63755 Alzenau
DE
63755 Alzenau
DE
Trademark representatives
Josephspitalstr. 15
80331 München
DE
goods and services
07
Coating machines and installations consisting thereof,
particularly sputter machines and installations consisting
thereof; magnetron sputter machines and apparatuses
consisting thereof, particularly magnetron sputtering
machines utilizing a tiltable magnetron and parts thereof;
low energy sputtering machines; machines, apparatus and
instruments for manufacturing displays, batteries and touch
panels; machines, apparatus and instruments for use in the
manufacture of thin film transistors; machines, apparatus
and instruments for use in the manufacture of liquid crystal
displays; thin film processing equipment, thin film
processing vacuum equipment, deposition processing
equipment, all of the before-mentioned machines and
installations adapted to coat all kinds of substrates of
synthetic and/or mineral materials, particularly, mineral
glasses, with transparent and/or opaque and/or wear
resistant and/or optical and/or conductive and/or
non-conductive coatings, and/or coatings having an
electrical or electronic functionality, and/or transparent
conductive coatings, such as indium tin oxide coatings
09
Semiconductors; computer programs for use with glass
substrate processing equipment and components thereof,
namely, physical vapor deposition reactors, particularly
magnetron sputtering machines, supporting frames therefore
and components thereof; computer programs for use with
displays, batteries and touch panels; computer programs for
use with sputter cathodes and rotatable sputter cathodes,
particularly magnetron sputtering machines utilizing a
tiltable magnetron and parts thereof
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| October 29, 2019 | 2019/46 Gaz | IN | RAW: Rule 18ter(2)(i) GP following a provisional refusal |
| February 21, 2019 | 2019/11 Gaz | CN | RAW: Rule 18ter(4) protected goods and services |
| December 14, 2016 | 2016/51 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| December 8, 2016 | 2016/51 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| October 17, 2016 | 2016/43 Gaz | IN | Rejection |
| August 10, 2016 | 2016/35 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| July 28, 2016 | 2016/36 Gaz | CN | Rejection |
| July 26, 2016 | 2016/32 Gaz | EM | Rejection |
| February 26, 2016 | 2016/10 Gaz | KR | Rejection |
| February 25, 2016 | 2016/9 Gaz | JP | Rejection |
| October 8, 2015 | 2015/41 Gaz | US | Rejection |
| June 24, 2015 | 2015/37 Gaz | DE | Registration |
ID: 141265787