centrotherm

WIPO WIPO 2014

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The International trademark centrotherm was filed as Word mark on 01/27/2014 at the World Intellectual Property Organization.

Trademark Details Last update: July 27, 2022

Trademark form Word mark
File reference 1205425
Register number 302013044959.2/40
Countries Australia em India Japan South Korea Norway Philippines Singapore United States of America (USA) Switzerland China Russia
Base trademark DE No. 30 2013 044 959.2/40, December 19, 2013
Application date January 27, 2014
Expiration date January 27, 2024

Trademark owner

Württemberger Straße 31
89143 Blaubeuren
DE

Trademark representatives

goods and services

07 Machines for processing of semiconductors and solar cells; machines for thermal processing of semiconductors and processing under vacuum; machines for etching of semiconductor surfaces; machines for deposition or coating of semiconductor surfaces, under vacuum (so-called CVD processes) or atmospherically or under plasma effect; machines for conveying (atmospherically or sub-atmospherically or under predefined gas atmosphere); machines for thermal processing of surfaces and objects, namely radiation-based rapid heating systems consisting of machines and plasma-based machines and the combination thereof; machines for atomic layer deposition (ALD); exhaust gas recycling machines
11 Enamelling furnaces; vacuum furnaces; machines for cleaning of gases and exhaust gases; diffusion furnaces
37 Construction, repair, installation and maintenance work, namely in respect of machines and machine tools and their components, overall for the production and processing respectively of solar cells (turnkey solutions) and raw materials therefor; services for assembly of semiconductor elements, both atmospheric and sub-atmospheric
40 Service for material coating; analysis and material modification and for processing of surfaces, in particular semiconductor surfaces
42 Services of engineers; advice and analysis for thermal, plasma or chemical treatment under controlled gas atmosphere, atmospherically or sub-atmospherically for surfaces in general or for specific semiconductor surfaces; technical project planning; technical planning of factories for the production of solar cells including technology selection; technical planning of factory layouts, factory configurations and production lines

Trademark history

Date Document number Area Entry
August 3, 2018 2018/32 Gaz PH RAW: Total Invalidation
November 3, 2016 2017/23 Gaz SG RAW: Rule 18ter(2)(ii) GP following a provisional refusal
September 21, 2015 2015/39 Gaz IN Rejection
May 22, 2015 2015/22 Gaz RU Rejection
May 12, 2015 2015/24 Gaz CH Rejection
April 27, 2015 2015/26 Gaz KR RAW: Rule 18ter(2)(ii) GP following a provisional refusal
April 14, 2015 2015/16 Gaz EM Rejection
April 9, 2015 2015/15 Gaz JP RAW: Rule 18ter(2)(ii) GP following a provisional refusal
April 9, 2015 2015/15 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
January 26, 2015 2015/5 Gaz CN Rejection
January 23, 2015 2015/5 Gaz NO Rejection
January 15, 2015 2015/3 Gaz PH Rejection
December 10, 2014 2014/50 Gaz AU RAW: Rule 18ter(2)(ii) GP following a provisional refusal
November 27, 2014 2014/48 Gaz JP Rejection
November 12, 2014 2014/46 Gaz KR Rejection
October 8, 2014 2014/43 Gaz SG Rejection
August 7, 2014 2014/32 Gaz AU Rejection
June 26, 2014 2014/26 Gaz US Rejection
January 27, 2014 2014/22 Gaz DE Registration

ID: 141205425