CMP DRY-IN DRY-OUT

WIPO WIPO 2013

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The International trademark CMP DRY-IN DRY-OUT was filed as Figurative mark on 09/25/2013 at the World Intellectual Property Organization.

Logodesign (Wiener Klassifikation)

#Natural phenomena #Circles #Colours #Vortices, rotary movements, tornadoes #26.01.02 #More than two circles, inside one another, spirals #Circles with inscriptions projecting beyond the circumference #Two predominant colours

Trademark Details Last update: July 11, 2023

Trademark form Figurative mark
File reference 1184217
Register number 4426741
Countries Switzerland China Germany European Community France Ireland Israel South Korea Russia Singapore United States of America (USA)
Base trademark JP No. 4426741, October 20, 2000
Application date September 25, 2013
Expiration date September 25, 2033

Trademark owner

11-1, Haneda Asahi-cho,
Ota-ku
JP

Trademark representatives

Section 206, New Ohtemachi Building 2-1, JP

goods and services

07 Chemical-mechanical polishing machines used for semiconductor wafers

Trademark history

Date Document number Area Entry
September 25, 2023 2023/28 Gaz Extension
June 20, 2019 2019/25 Gaz CH Rejection
April 15, 2019 2019/18 Gaz CN RAW: Rule 18ter(4) all goods and services protected
March 26, 2019 2019/14 Gaz RU Rejection
February 1, 2019 2019/6 Gaz EM Rejection
June 22, 2018 2018/33 Gaz JP Correction
August 20, 2015 2015/36 Gaz SG RAW: Rule 18ter(2)(i) GP following a provisional refusal
July 8, 2015 2015/28 Gaz IL Rejection
January 16, 2015 2015/5 Gaz CN Rejection
December 3, 2014 2014/49 Gaz US RAW: Rule 18ter(2)(i) GP following a provisional refusal
August 12, 2014 2014/33 Gaz KR Rejection
July 28, 2014 2014/31 Gaz IE Rejection
May 14, 2014 2014/23 Gaz FR Rejection
May 7, 2014 2014/19 Gaz DE Rejection
May 7, 2014 2014/20 Gaz SG Rejection
January 14, 2014 2014/3 Gaz US Rejection
September 25, 2013 2013/47 Gaz JP Registration

ID: 141184217