ASML Logo (WIPO, 02/10/2012)
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The International trademark ASML was filed as Figurative mark on 02/10/2012 at the World Intellectual Property Organization.
Logodesign (Wiener Klassifikation)
#Letters presenting a special form of writing #Letters in heavy characters
| Trademark form | Figurative mark |
| File reference | 1113758 |
| Register number | 915377 |
| Countries | 
|
| Base trademark |
No. 915377,
March 1, 2012
|
| Application date | February 10, 2012 |
| Expiration date | February 10, 2032 |
Trademark owner
De Run 6501
5504 DR Veldhoven
NL
5504 DR Veldhoven
NL
Trademark representatives
Koninginnegracht 35
THE HAGUE
NL
goods and services
07
Micro-lithography machines; machines for use in the
electronics, integrated circuit, semi-conductor, magnetic
domain memory and integrated optical systems industries;
parts for all the aforesaid goods
09
Optical, measuring, signalling, checking (supervision)
apparatus and instruments; telescopes, binoculars,
telescopic spectacles; hunting binoculars, telescopic sights
for hunting, theatre glasses, telescopic sights; spectacle
frames; spectacle glasses, polarising spectacles, contact
lenses, magnifying glasses, magnifying spectacles,
protective spectacles, including spectacles for protection
against lasers; aspherical and astronomical optics,
astrographs; astrographic lenses, photographic lenses,
semiconductor lenses, microscope lenses, supplementary
lenses; lens carriers; lens caps; astronomical instruments;
prisms, glass measures; crystal components and synthetic
crystals for optical purposes, eye-pieces; optical crystals,
optical mirrors; surface testing equipment; profilometers;
apparatus and software for metrology; micro-lithography
equipment; apparatus and instruments for use in
micro-lithographic production, especially of electronic
components, semi-conductors, integrated circuits, magnetic
domain memories and integrated optical systems (as far as
not included in other classes); apparatus and instruments
for use in micro-lithography; software for use in the
electronics, micro-lithography, semi-conductor, integrated
circuit, magnetic domain memory and integrated optical
systems industries; software for the design, testing and
fabrication of photo-lithographic masks; semi-conductors;
integrated circuits; photo-lithographic masks; magnetic
heads, chips, gene chips, LCDs, display screens, magnetic
domain memories, integrated optical systems; parts for all
the aforesaid goods
37
Maintenance and repair services in connection with machines,
apparatus and instruments for use in the electronics,
micro-lithography, semi-conductor, integrated circuit,
magnetic domain memories and integrated optical systems
industries
40
Cutting, polishing and coating of glass and other optical
surfaces
41
Education and training in connection with the electronics,
micro-lithography, semi-conductor, integrated circuit,
magnetic domain memories and integrated optical systems
industries; education and training in connection with the
use of software in the electronics, micro-lithography,
semi-conductor, integrated circuit, magnetic domain memories
and integrated optical systems industries; advisory and
consultancy services in connection with the aforesaid
services
42
Technical advisory and consultancy services (services of
engineers) in connection with machines, apparatus and
instruments for use in the electronics, micro-lithography,
semi-conductor, integrated circuit, magnetic domain memories
and integrated optical systems industries; design,
maintenance and development of computer software for use in
the electronics, micro-lithography, semi-conductor,
integrated circuit, magnetic domain memories and integrated
optical systems industries and for the design, testing and
fabrication of photo-lithographic masks; advisory and
consultancy services in connection with the aforesaid
services
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| February 27, 2023 | 2023/9 Gaz | Correction | |
| February 10, 2022 | 2022/6 Gaz | Extension | |
| March 14, 2021 | 2021/13 Gaz | US | RAW: Partial Invalidation |
| September 5, 2015 | 2015/41 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| January 8, 2014 | 2014/2 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| September 3, 2013 | 2013/36 Gaz | IL | Rejection |
| July 5, 2013 | 2013/28 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| May 2, 2013 | 2013/18 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| December 27, 2012 | 2013/3 Gaz | CN | Rejection |
| November 8, 2012 | 2012/45 Gaz | JP | Rejection |
| October 15, 2012 | 2012/42 Gaz | KR | Rejection |
| July 26, 2012 | 2012/38 Gaz | SG | Rejection |
| May 25, 2012 | 2012/22 Gaz | US | Rejection |
| February 10, 2012 | 2012/17 Gaz | BX | Registration |
ID: 141113758