SCHMID

WIPO WIPO 2011

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The International trademark SCHMID was filed as Figurative mark on 05/10/2011 at the World Intellectual Property Organization.

Logodesign (Wiener Klassifikation)

#Surfaces or backgrounds covered with repeated geometrical figures, figurative elements or inscriptions #Lines, bands #Letters presenting a special form of writing #Surfaces or backgrounds covered with lines or bands #Curved lines or bands (except A 26.11.13) #Letters linked to a figurative element #Letters in heavy characters

Trademark Details Last update: May 24, 2021

Trademark form Figurative mark
File reference 1095274
Countries China South Korea United States of America (USA)
Base trademark EU No. 009613993, December 21, 2010
Application date May 10, 2011
Expiration date May 10, 2031

Trademark owner

Robert-Bosch-Str. 32-34
72250 Freudenstadt
DE

Trademark representatives

goods and services

01 Chemicals used in industry, science and photography; semiconductor materials, in particular silicon, ultra-pure silicon and silanes; chemicals for surface treatments, in particular for the surface treatment of metals, semiconductor materials, glass, plastics or polymers; corrosive preparations; galvanizing preparations; galvanic baths and salts for galvanic cells; chemical substances for laboratory analyses (except for medical and veterinary purposes); tempering and soldering preparations
07 Machines, installations and machine tools, in particular automated machines, installations and production lines; machine parts, spare parts and accessories for machines, installations and machine tools; transport installations; handling machines and handling apparatus, in particular robots, manipulators and grabs; transporters; machines and installations for the production, coating and/or processing of materials, in particular for the manufacture and/or processing of flat substrates for the circuit board industry and the photovoltaic industry; presses, in particular laminating presses for the manufacture of solar modules, circuit boards and smart cards; machines and installations for the manufacture of chemical products, in particular for the manufacture of silicon and silanes; machines and installations for coating and/or surface treatment of materials, in particular semiconductor materials, glass, plastics or polymers; machines and installations for acid treatments and cleaning treatments; machines and installations for galvanising; vacuum installations
09 Scientific, photographic, cinematographic, optical, weighing, measuring, signalling and checking (supervision) apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; electric apparatus and electric accessories for the circuit board and photovoltaic industries, for electroplating, silicon production, silane production and for the manufacture of circuit boards, solar cells and/or solar modules; data-processing equipment and computers; printers and printing apparatus, in particular ink-jet printers and laser printers and parts therefor; software, in particular operating software, in particular for cinematographic, weighing, measuring, signalling and checking (supervision) apparatus and instruments, for machines and installations for the circuit board and photovoltaic industries, for silicon production, for silane production and for galvanising installations; measuring machines; operating software for machines and installations for the manufacture of circuit boards and semiconductor products, in particular photovoltaic cells, photovoltaic wafers, semiconductor wafers, solar cells and solar modules
11 Apparatus for heating and drying; diffusion furnaces, in particular furnaces for industrial use
20 Packaging containers, containers, carriers, transport carriers, transport racks, trolleys or handling pallets of plastic, in particular of composite materials, including carbon fibre, glass fibre, aramid fibre, kevlar fibre, basalt fibre
40 Treatment of materials, in particular treatment of semiconductor materials, glass, plastics or polymers; surface treatment of materials, in particular of semiconductor materials, glass, plastics or polymers; etching; texturing; magnetisation; cleaning; electroplating; lasering; printing; information and consultancy with regard to the treatment of materials; manufacture of semiconductor materials, in particular for the production of silicon, ultra-pure silicon and silanes; manufacture of circuit boards and semiconductor products, in particular photovoltaic cells, photovoltaic wafers, semiconductor wafers, solar cells and solar modules

Trademark history

Date Document number Area Entry
May 10, 2021 2021/20 Gaz Extension
March 20, 2015 2015/13 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
September 13, 2013 2013/38 Gaz KR RAW: Rule 18ter(2)(ii) GP following a provisional refusal
January 24, 2013 2013/15 Gaz RAW: Limitation
January 17, 2013 2013/4 Gaz KR Rejection
September 13, 2012 2012/39 Gaz CN Rejection
June 4, 2012 2012/23 Gaz KR Rejection
November 22, 2011 2011/47 Gaz US Rejection
May 10, 2011 2011/43 Gaz EM Registration

ID: 141095274