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The International trademark LEVEL was filed as Word mark on 07/11/2011 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1090159 |
| Countries | 
|
| Base trademark |
No. 85353239,
June 22, 2011
|
| Application date | July 11, 2011 |
| Expiration date | July 11, 2031 |
Trademark owner
2401 Brewer Drive
Rolla, MO 65401
US
Rolla, MO 65401
US
Trademark representatives
Hovey Williams LLP,
10801 Mastin Blvd, Suite 1000
US
goods and services
01
Chemical compositions, namely, self-planarizing materials
used in the microelectronics, photolithography and
semiconductor industries
42
Technical consultancy in relation to the production of
self-planarizing materials used in the microelectronics,
photolithography and semiconductor industries; development
and testing of self-planarizing materials used in the
microelectronics, photolithography and semiconductor
industries; development and testing, through extreme
topography process, of self-planarizing materials used in
the microelectronics, photolithography and semiconductor
industries
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| July 11, 2021 | 2021/28 Gaz | Extension | |
| May 22, 2013 | 2013/29 Gaz | US | RAW: Partial Ceasing Effect |
| November 1, 2012 | 2012/44 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| September 25, 2012 | 2012/40 Gaz | EM | RAW: Rule 18ter(2)(i) GP following a provisional refusal |
| September 3, 2012 | 2012/36 Gaz | KR | Rejection |
| August 17, 2012 | 2012/34 Gaz | EM | Rejection |
| May 29, 2012 | 2012/27 Gaz | RAW: Limitation | |
| March 20, 2012 | 2012/12 Gaz | KR | Rejection |
| March 15, 2012 | 2012/11 Gaz | JP | Rejection |
| February 1, 2012 | 2012/5 Gaz | SG | Rejection |
| July 11, 2011 | 2011/37 Gaz | US | Registration |
| Partial deletion |
ID: 141090159