soulbrain Logo (WIPO, 04/26/2011)
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The International trademark soulbrain was filed as Figurative mark on 04/26/2011 at the World Intellectual Property Organization.
Logodesign (Wiener Klassifikation)
#Letters presenting a special form of writing #Colours #Letters overlapping #Two predominant colours
| Trademark form | Figurative mark |
| File reference | 1084033 |
| Countries | 
|
| Base trademark |
No. 4020110018997,
April 11, 2011
|
| Application date | April 26, 2011 |
| Expiration date | April 26, 2031 |
Trademark owner
34, Pangyo-Ro
255 Beon-gil Bundang-Gu,
KR
255 Beon-gil Bundang-Gu,
KR
Trademark representatives
Deawangpangyo-ro 670,
A-302 (Sampyung-dong, U Space 2),
KR
goods and services
01
Caustic alkali; getters [chemically active substances];
surface-active chemical agents; caustic soda for industrial
purposes; dioxide of hydrogen; glycerine for industrial
purposes; chemical preparations for industrial or scientific
purposes; caustics for industrial purposes; industrial
chemicals; salts for industrial purposes; acetates
[chemicals] for industrial purposes; carbon black for
industrial purposes; hydrogen peroxide; perchlorates;
silicon; sodium salts [chemical preparations]; acid proof
chemical compositions; potassium dioxalate; anhydrides;
antifreezing agents; corrosive preparations; fluorine;
fluorspar compounds; hydrofluoric acid; borax; borates;
sorrel salt; Lithia [lithium oxide]; chromium oxide;
salicylic acid; hydrates; aluminium hydrate; calcium
hydroxides hydrogen; salts of alkaline metals; alkalies;
alkaline-earth metals; alcohol; ethyl alcohol; ammonium
salts; chemical preparations, except pigments, for the
manufacture of enamel; spirits of salt; hydrochlorates;
chlorides; sal ammoniac; oxalic acid; iodic acid;
organo-metallic compounds; organic acid; flocculants; ion
exchangers [chemical preparations]; phosphoric acid;
automobile body fillers; additives, chemical, to motor fuel;
battery anti-sulphurizing agents; detergents for use in
manufacturing processes; nitric acid; nitrates; hypochlorite
of soda; iron salts; acetates [chemicals]; calcium salts;
chemical reagents, other than for medical or veterinary
purposes; bromine for chemical purposes; sulphuric acid;
copper sulphate [vitriol]; etchant for semiconductor
manufacturing processes; etchant for LCD manufacturing
processes; etchant for TFT-LCD manufacturing processes;
etchant for organic EL; thin films for semiconductor
manufacturing; materials for inter layer dielectric;
materials for diffusion barrier; materials for capacitor
dielectric; thin films; nitride thin films; epi-silicon thin
films; ionic diffusion materials; abrasives for
semiconductor manufacturing processes; electrolytes
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| September 13, 2022 | 2022/38 Gaz | MY | Rejection |
| July 3, 2021 | 2021/27 Gaz | SE | Rejection |
| April 26, 2021 | 2021/17 Gaz | Extension | |
| April 19, 2021 | 2021/16 Gaz | HU | Rejection |
| March 23, 2021 | 2021/12 Gaz | FR | Rejection |
| February 2, 2021 | 2021/5 Gaz | PL | Rejection |
| February 1, 2021 | 2021/5 Gaz | DE | Rejection |
| December 29, 2020 | 2021/2 Gaz | Correction | |
| August 24, 2020 | 2020/37 Gaz | Correction | |
| June 24, 2019 | 2019/41 Gaz | US | RAW: Partial Invalidation |
| September 30, 2013 | 2013/43 Gaz | JP | RAW: Rule 18ter(2)(i) GP following a provisional refusal |
| May 6, 2013 | 2013/20 Gaz | RAW: Limitation | |
| February 6, 2013 | 2013/8 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| December 18, 2012 | 2013/35 Gaz | KR | RAW: Partial Ceasing Effect |
| May 14, 2012 | 2012/20 Gaz | CN | Rejection |
| February 9, 2012 | 2012/6 Gaz | JP | Rejection |
| August 17, 2011 | 2011/33 Gaz | US | Rejection |
| April 26, 2011 | 2011/29 Gaz | KR | Registration |
ID: 141084033