WIPOProtect this trademark from copycats!
With our trademark monitoring alerts, you are automatically notified by email about copycats and free riders.
The International trademark EXTERION was filed as Word mark on 03/16/2009 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1003112 |
| Countries | 
|
| Base trademark |
No. 2008-76069,
September 17, 2008
|
| Application date | March 16, 2009 |
| Expiration date | March 16, 2029 |
Trademark owner
4-4-26 Sakuragawa,
Naniwa-ku,
JP
Naniwa-ku,
JP
Trademark representatives
Iwata Tokyu Building, 8th Floor,
2-8, Bakuromachi 3-Chome,
JP
goods and services
01
Chemicals
03
Polishing pads; abrasive paper (sand paper); abrasive cloth;
abrasive sand; polishing paper; polishing cloth; polishing
preparations; semiconductor polishing slurries; polishing
slurries
07
Polishing machines and apparatus for glass; polishing pads
for glass substrate; polishing machines and apparatus for
glass substrate; parts and accessories of polishing machines
and apparatus for glass substrate; polishing pads for
semiconductor wafer; polishing machines and systems for
semiconductor wafer surface; parts and accessories of
polishing machines and systems for semiconductor wafer
surface; semiconductor manufacturing machines and systems
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| March 16, 2019 | 2019/12 Gaz | Extension | |
| January 10, 2017 | 2017/13 Gaz | US | RAW: Partial Invalidation |
| November 9, 2010 | 2013/4 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| May 27, 2010 | 2013/3 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| May 11, 2010 | 2010/19 Gaz | EM | Rejection |
| April 6, 2010 | 2010/18 Gaz | KR | Rejection |
| September 28, 2009 | 2009/40 Gaz | SG | Rejection |
| June 29, 2009 | 2009/28 Gaz | US | Rejection |
| March 16, 2009 | 2009/24 Gaz | JP | Registration |
ID: 141003112