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The US trademark LAL was filed as Word mark on 04/10/2006 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 03/25/2008.
The current status of the mark is "SECTION 71 ACCEPTED".
| Trademark form | Word mark |
| File reference | 79031145 |
| Register number | 3402024 |
| Application date | April 10, 2006 |
| Publication date | January 8, 2008 |
| Entry date | March 25, 2008 |
Trademark owner
Chuo-ku, Osaka City Osaka 541-0044
Trademark representatives
goods and services
1
Chemicals used in industry; chemicals used in manufacturing structures of semiconductors, integrated circuits, microscales and nano-scales and for acceleration of etching process and for forming patterns on a substrate; chemicals used in manufacturing semiconductors; chemical products for use in manufacture of semiconductors, namely, etchants for rinsing semiconductors; chemicals for use in the manufacture of flat panel displays for use in forming patterns on the substrates of flat panel display such as liquid crystal and electroluminescent (EL); chemicals used for manufacturing of flat panel displays; chemical etchant for use in the manufacture of flat panel displays
ID: 1379031145