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The US trademark ASYNTIS was filed as Word mark on 05/07/2003 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 03/08/2005.
The current status of the mark is "CANCELLED - SECTION 8".
| Trademark form | Word mark |
| File reference | 78246592 |
| Register number | 2930562 |
| Application date | May 7, 2003 |
| Publication date | December 14, 2004 |
| Entry date | March 8, 2005 |
Trademark owner
Im Westpark 10-12
35435 Wettenberg
DE
35435 Wettenberg
DE
Trademark representatives
goods and services
7
Machines and machine tools for plasma treatment of silicon articles, namely, semiconductor wafer processing machines, semiconductor manufacturing machines, semiconductor substrate manufacturing machines; semiconductor substrate etching machines; grinding machines for grinding semiconductors, in particular for back grinding wafers, in particular silicon wafers; machines for transport and storage of silicon discs, namely grippers, wands, tweezers, chucks, robots, robot arms, lifts and cassettes; plasma etching machines; machines for processing gas plasma, gas plasma generator
9
Data processors; computer hardware and software for controlling plasma treatment equipment; apparatus and instruments for conducting, switching, transforming, accumulating, regulating and/or controlling electric current for operating plasma treatment equipment, namely, electrical conductors, electrical switches, electrical transformers, electric accumulators, voltage regulators for electric power
42
Services in the field of science and technology as well as corresponding research, development and designer services, namely, research and consulting in the field of plasma treatment of articles; industry analysis and research services, namely, providing technical, engineering, scientific and computer consultation services in the field of semiconductors; engineering; planning, leading and surveillance of projects, namely, conducting technical research, design and product development projects in the field of plasma technology; designing equipment and system controls for treatment and manufacture of silicon articles; adaptation and development of operating parameters for the field of plasma treatment equipment
ID: 1378246592