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The US trademark SEIMICRON was filed as Word mark on 07/13/2007 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 04/13/2010.
The current status of the mark is "SECTION 8 & 15-ACCEPTED AND ACKNOWLEDGED".
| Trademark form | Word mark |
| File reference | 77228929 |
| Register number | 3775151 |
| Application date | July 13, 2007 |
| Publication date | June 24, 2008 |
| Entry date | April 13, 2010 |
Trademark owner
5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU
100-8405 TOKYO
JP
100-8405 TOKYO
JP
Trademark representatives
goods and services
1
Chemical mechanical polishing slurry with water-based solutions and abrasives for polishing semiconductor materials
3
Grinding preparations, namely, liquids for industrial purposes; polishing preparations for industrial purposes; abrasives preparations for industrial purposes; scouring solutions for industrial purposes
ID: 1377228929