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The US trademark C P-LOK was filed as Word mark on 05/29/2007 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED - NO STATEMENT OF USE FILED".
| Trademark form | Word mark |
| File reference | 77192004 |
| Application date | May 29, 2007 |
| Publication date | November 20, 2007 |
Trademark owner
8555 RIVER PARKWAY
85284 TEMPE
US
85284 TEMPE
US
Trademark representatives
goods and services
1
Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, namely, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (CMP) cleaning chemical preparations for removing slurries and polishing debris
ID: 1377192004