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The US trademark XUV was filed as Word mark on 10/12/2006 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 03/03/2009.
The current status of the mark is "CANCELLED - SECTION 8".
| Trademark form | Word mark |
| File reference | 77019437 |
| Register number | 3582083 |
| Application date | October 12, 2006 |
| Publication date | May 6, 2008 |
| Entry date | March 3, 2009 |
Trademark owner
5-1, NIHONBASHI 2-CHOME
CHUO-KU, TOKYO
JP
CHUO-KU, TOKYO
JP
Trademark representatives
goods and services
1
Chemical preparations for forming resist lower-layer films in multi-layer resist films for use in lithography processes; photographic supplies, namely, photometric paper, diazo paper, sensitized but not exposed cinematographic film, unexposed sensitized photographic films, sensitized but not exposed x-ray films, photographic emulsions, photographic sensitizers, sensitized paper for photography, sensitized photographic dry plates, sensitized cloth for photography, photographic dry plates, light resistant powder for photography, self-toning paper for photography, fixing solutions for photography, gelatine for photographic purposes, toning baths for photography, toning salts for photography, ferrotype plates for photography, pectin for photography, photographic paper, photographic developers, solutions for cyanotyping, blueprint cloth, blueprint paper
2
Paints; anti-reflective coating compositions for use in the manufacture of integrated circuits, semiconductor devices, computer disk drives and other computer hardware
ID: 1377019437