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The US trademark RUN FAST STAY COOL was filed as Word mark on 04/12/2005 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED - NO STATEMENT OF USE FILED".
| Trademark form | Word mark |
| File reference | 76636486 |
| Application date | April 12, 2005 |
| Publication date | March 28, 2006 |
Trademark owner
M/S 2061
95054 Santa Clara
US
95054 Santa Clara
US
Trademark representatives
goods and services
9
Semiconductor wafer processing equipment, operational software, and components, namely-- epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
16
Brochures and newsletters published periodically regarding equipment and machines for the processing and production of semiconductor substrates, thin films, silicon discs and wafers, semiconductor processing and production equipment manuals
ID: 1376636486