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The US trademark CLEAN W was filed as Word mark on 01/13/2003 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 03/14/2006.
The current status of the mark is "CANCELLED - SECTION 8".
| Trademark form | Word mark |
| File reference | 76481968 |
| Register number | 3068618 |
| Application date | January 13, 2003 |
| Publication date | March 16, 2004 |
| Entry date | March 14, 2006 |
Trademark owner
3050 Bowers Avenue
95054 Santa Clara
US
95054 Santa Clara
US
Trademark representatives
goods and services
7
Semiconductor wafer processing machines and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon chips and silicon wafers
ID: 1376481968