SUPERMASK Logo (USPTO, 09/20/2002)
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The US trademark SUPERMASK was filed as Word and figurative mark on 09/20/2002 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED - NO STATEMENT OF USE FILED".
| Trademark form | Word and figurative mark |
| File reference | 76451383 |
| Application date | September 20, 2002 |
| Publication date | December 30, 2003 |
Trademark owner
High Technical Industrial Zone
Shenzhen
CN
Shenzhen
CN
Trademark representatives
goods and services
9
photo-mask substrate and photo-chrome mask for use in LCD displays for photography and all types of film
ID: 1376451383