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The US trademark ADVANCED PATTERNING FILM was filed as Word mark on 06/05/2002 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED - NO STATEMENT OF USE FILED".
| Trademark form | Word mark |
| File reference | 76417720 |
| Application date | June 5, 2002 |
| Publication date | July 6, 2004 |
Trademark owner
3050 Bowers Avenue
95054 Santa Clara
US
95054 Santa Clara
US
Trademark representatives
goods and services
9
Semiconductor wafer processing equipment, operational software, and components, namely epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
17
Insulating films for use in the manufacture of semiconductors
ID: 1376417720