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The US trademark DEPOSITION MODE was filed as Word mark on 04/30/2002 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED - NO STATEMENT OF USE FILED".
| Trademark form | Word mark |
| File reference | 76402571 |
| Application date | April 30, 2002 |
| Publication date | April 27, 2004 |
Trademark owner
3050 Bowers Avenue
95054 Santa Clara
US
95054 Santa Clara
US
Trademark representatives
goods and services
9
Semiconductor wafer processing equipment and operational software and components for such equipment, namely, wafer processing equipment in the nature of epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, measuring and monitoring tools, and chemical mechanical polishers; all such equipment used for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
ID: 1376402571