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The US trademark FATHOM was filed as Word mark on 12/11/2001 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 01/20/2004.
The current status of the mark is "CANCELLED - SECTION 8".
| Trademark form | Word mark |
| File reference | 76347903 |
| Register number | 2807148 |
| Application date | December 11, 2001 |
| Publication date | January 14, 2003 |
| Entry date | January 20, 2004 |
Trademark owner
4150 Freidrich Lane, Suite A
78744 Austin
US
78744 Austin
US
Trademark representatives
goods and services
9
Inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes, for use in the manufacturing and testing of semiconductors
37
Installation, maintenance and repair of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes
40
Custom manufacture of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes
42
On-site and off-site inspection services for the semiconductor industry, namely wafer inspection, reticle inspection, defect detection, defect review, defect classification, nanotopography measurement, wafer flatness measurement, surface profiling, film thickness measurement, critical dimension measurement, and microscopy; and leasing and consultation of inspection and test equipment for the semiconductor industry, namely wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes; design of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes
ID: 1376347903