E-MASK AND DESIGN Logo (USPTO, 05/09/2001)
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The US trademark E-MASK AND DESIGN was filed as Figurative mark on 05/09/2001 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED-FAILURE TO RESPOND OR LATE RESPONSE".
| Trademark form | Figurative mark |
| File reference | 76254586 |
| Application date | May 9, 2001 |
Trademark owner
Science-Based Industrial Park
Hsin Chu
TW
Hsin Chu
TW
Trademark representatives
goods and services
9
PHOTOMASKS USED TO MANUFACTURE SEMICONDUCTORS AND INTEGRATED CIRCUITS
40
CUSTOMER MANUFACTURING OF PHOTOMASKS, CUSTOM ASSEMBLING OF PHOTOMASKS FOR OTHERS
42
TEST OF PHOTOMASKS FOR OTHERS; DESIGNING OF PHOTOMASKS
ID: 1376254586