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The US trademark PLAS FINE PER was filed as Word mark on 06/30/2000 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED - EXPRESS".
| Trademark form | Word mark |
| File reference | 76081945 |
| Application date | June 30, 2000 |
| Publication date | January 22, 2002 |
Trademark owner
58 Ijiri, Iseda-cho
Uji-shi, Kyoto 611-0043
JP
Uji-shi, Kyoto 611-0043
JP
Trademark representatives
goods and services
1
ETCHING RESIST, PLATING RESIST, SOLDER RESIST, FILING RESIN USED FOR MANUFACTURING PRINTED CIRCUIT BOARD; PHOTOSENSITIVE DRY FILMS FOR USE IN THE MANUFACTURE OF PRINTED CIRCUITS, NAMELY, DRY FILM PHOTORESIST; AND PHOTOSENSITIVE CHEMICALS, NAMELY, LIQUID PHOTOIMAGEABLE SOLDER RESIST, AND ELECTRODEPOSITED PHOTORESIST
ID: 1376081945