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The US trademark BARRACUDA was filed as Word mark on 06/20/2000 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 11/12/2002.
The current status of the mark is "CANCELLED - SECTION 8".
| Trademark form | Word mark |
| File reference | 76075632 |
| Register number | 2648048 |
| Application date | June 20, 2000 |
| Publication date | August 20, 2002 |
| Entry date | November 12, 2002 |
Trademark owner
Carl-Benz-Strasse 10
72124 Pliezhausen
DE
72124 Pliezhausen
DE
Trademark representatives
goods and services
7
Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces
37
Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces
ID: 1376075632