STEAG HAMATECH Logo (USPTO, 04/02/1997)
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The US trademark STEAG HAMATECH was filed as Word and figurative mark on 04/02/1997 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 02/16/1999.
The current status of the mark is "CANCELLED - SECTION 8".
| Trademark form | Word and figurative mark |
| File reference | 75268163 |
| Register number | 2223627 |
| Application date | April 2, 1997 |
| Publication date | November 24, 1998 |
| Entry date | February 16, 1999 |
Trademark owner
Ferdinand-von-Steinbeis-Ring 10
D-75447 Sternenfels
DE
D-75447 Sternenfels
DE
Trademark representatives
goods and services
7
mechanical apparatus, equipment and systems comprised thereof, namely, machines for manufacturing semiconductor substrates, silicon chips, wafers, photo masks, compact discs and laser discs; machines for wet-chemical processing of semiconductor substrates, silicon chips, wafers, photo masks, compact discs and laser discs; manual and automatic machines for cleaning lacquering, developing, etching and stripping semiconductor substrates, silicon chips, wafers, photo masks, compact discs and laser discs
37
installation, procedural optimization and maintenance for others of the following items - machines for manufacturing semiconductor substrates, silicon chips, wafers, photo masks, compact discs and laser discs; machines for wet-chemical processing of semiconductor substrates, silicon chips, wafers, photo masks, compact discs and laser discs; manual and automatic machines for cleaning lacquering, developing, etching and stripping semiconductor substrates, silicon chips, wafers, photo masks, compact discs and laser discs
ID: 1375268163