Ae Logo (EUIPO, 08/14/2019)
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The Union trademark Ae was filed as Figurative mark on 08/14/2019 at the European Union Intellectual Property Office.
It was registered as a trademark on 02/29/2020.
The current status of the mark is "Trademark registered".
Logodesign (Wiener Klassifikation)
#Monograms formed of intertwined, overlapping or otherwise combined letters #Letter 'A' #Letter 'E'
| Trademark form | Figurative mark |
| File reference | 018108050 |
| Application date | August 14, 2019 |
| Publication date | November 22, 2019 |
| Entry date | February 29, 2020 |
| Expiration date | August 14, 2029 |
Trademark owner
91 Trillium Drive
N2E 1W8 Kitchener
CA
N2E 1W8 Kitchener
CA
Trademark representatives
Liebigstr. 39
80538 München
DE
goods and services
1
Raw chemical materials, namely, metals, non-metals, ceramics, oxides, nitrides, organic compounds and polymers, used in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology
7
Physical and chemical vapor deposition systems, namely, machines used for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, atomic layer deposition; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes; deposition system components being parts of deposition machinery, namely, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; Vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation
40
Custom manufacturing physical and chemical vapor deposition systems; Custom manufacturing vacuum equipment and systems used for thin film deposition, etching and cleaning; Custom manufacturing vacuum equipment and systems used for controlled environment and space simulation
42
Designing, developing physical and chemical vapor deposition systems; engineering services in the field of physical and chemical vapor deposition systems; designing, developing vacuum equipment and systems used for thin film deposition, etching and cleaning; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; Designing, developing vacuum equipment and systems used for controlled environment and space simulation; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| October 1, 2019 | Change Representative, Registered |
ID: 11018108050