7
Apparatus for depositing on semiconductor wafers; apparatus for performing epitaxial growth on semiconductor wafers; apparatus for forming compound semiconductor films on semiconductor wafers; Metal Organic Chemical Vapor Deposition (MOCVD) apparatus for semiconductor manufacture; Chemical Vapor Deposition (CVD) apparatus for semiconductor manufacture; etching apparatus for semiconductor manufacture; other semiconductor manufacturing apparatus; control mechanisms used for semiconductor manufacturing apparatus (including reduced pressure control apparatus, temperature control apparatus, rotation control apparatus); gas supply apparatus and parts for gas supply used for semiconductor manufacturing apparatus; exhaust gas treatment apparatus and parts for exhaust gas treatment for semiconductor manufacturing apparatus; wafer carrier devices used for semiconductor manufacturing apparatus; wafer carrier robots used for semiconductor manufacturing apparatus; wafer cleaning apparatus used for semiconductor manufacturing apparatus; parts, accessories and pipes used for semiconductor manufacturing apparatus, control mechanisms for said apparatus, gas supply apparatus for said apparatus, exhaust gas treatment apparatus for said apparatus, wafer carrier devices for said apparatus, wafer carrier robots for said apparatus, wafer cleaning apparatus for said apparatus; pipes used for temperature measuring devices and wafer curvature measuring apparatus for semiconductor manufacturing apparatus
9
Temperature measuring devices used for semiconductor manufacturing apparatus; wafer curvature measuring apparatus used for semiconductor manufacturing apparatus; parts and accessories used for temperature measuring devices and wafer curvature measuring apparatus for semiconductor manufacturing apparatus
37
Repair, maintenance and installation of apparatus for depositing on semiconductor wafers, apparatus for performing epitaxial growth on semiconductor wafers and apparatus for forming compound semiconductor films on semiconductor wafers; repair, maintenance and installation of Metal Organic Chemical Vapor Deposition (MOCVD) apparatus for semiconductor manufacture, Chemical Vapor Deposition (CVD) apparatus for semiconductor manufacture, etching apparatus for semiconductor manufacture and other semiconductor manufacturing apparatus and parts, accessories and pipes therefor; repair, maintenance and installation of control apparatus used for semiconductor manufacturing apparatus (including reduced pressure control apparatus, temperature control apparatus, rotation control apparatus); repair, maintenance and installation of gas supply apparatus and parts for gas supply used for semiconductor manufacturing apparatus, exhaust gas treatment apparatus and parts for exhaust gas treatment used for semiconductor manufacturing apparatus and wafer carrier devices used for semiconductor manufacturing apparatus; repair, maintenance and installation of wafer carrier robots used for semiconductor manufacturing apparatus, wafer cleaning apparatus used for semiconductor manufacturing apparatus, temperature measuring devices used for semiconductor manufacturing apparatus, wafer curvature measuring apparatus used for semiconductor manufacturing apparatus and parts, accessories and pipes therefor; information supply with regards to repair, maintenance and installation of semiconductor manufacturing apparatus, control apparatus for said apparatus, gas supply apparatus for said apparatus and exhaust gas treatment apparatus for said apparatus; information supply with regards to repair, maintenance and installation of wafer carrier devices for said apparatus, wafer carrier robots for said apparatus, wafer cleaning apparatus for said apparatus, temperature measuring devices for said apparatus, wafer curvature measuring apparatus for said apparatus and parts, accessories and pipes therefor