PHOTONEECE

DPMA DPMA 1984 Trademark registered

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The German trademark PHOTONEECE was filed as Word and figurative mark on 12/05/1984 at the German Patent and Trademark Office.
It was registered as a trademark on 08/01/1985. The current status of the mark is "Trademark registered".

Logodesign (Wiener Klassifikation)

#Letters presenting a special form of writing

Trademark Details Last update: Today

Trademark form Word and figurative mark
File reference T24000
Register number 1080196
Application date December 5, 1984
Publication date September 14, 1985
Entry date August 1, 1985
Start of opposition period September 14, 1985
End of the opposition period December 16, 1985
Expiration date December 31, 2034

Trademark owner


Tokio/Tokyo
JP

Trademark representatives

goods and services

1 Fotosensible Polyamidsäurelösung für die Herstellung von Isolier- und Schutzschichten an elektronischen Bauteilen, wie Transistoren, Dioden, IC- und LSI-Elementen
The designations have been translated automatically. Show translation

Trademark history

Date Document number Area Entry
July 10, 2024 202400000069 4 Extension, Verlaengert
December 12, 2023 202300403563 8b Transfer / Change of address, Abgeschlossen
December 21, 2021 202100466507 8b Transfer / Change of address, Abgeschlossen
July 9, 2014 201300407261 4 Extension, Verlaengert
October 26, 2011 201100355808 8b Transfer / Change of address, Abgeschlossen
October 26, 2004 200403183775 Extension, Verlaengert
August 1, 1985 198500531980 Registration, Marke eingetragen
August 1, 1985 198500532145 Opposition period, Marke nicht geloescht

ID: 9999108424000